| 电镀非晶态镍钨合金工艺研究 |
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| 引用本文： | 万小波,张林,周兰,肖江. 电镀非晶态镍钨合金工艺研究[J]. 材料保护, 2006, 39(12): 23-25 |
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| 作者姓名： | 万小波 张林 周兰 肖江 |
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| 作者单位： | 中国工程物理研究院激光聚变研究中心,四川,绵阳,621900;中国工程物理研究院激光聚变研究中心,四川,绵阳,621900;中国工程物理研究院激光聚变研究中心,四川,绵阳,621900;中国工程物理研究院激光聚变研究中心,四川,绵阳,621900 |
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| 摘 要： | 研究了电镀非晶态镍钨合金工艺,采用EDS、XRD等手段检测了镍钨合金镀层,并将工艺条件如电流密度Jc、镀液pH值、镀液温度等对镀层的影响进行了比较,得出非晶态镍钨合金电镀的最佳工艺:[W]/([W] [Ni])为0.6～0.8,Jc=6.0～12.0 A/dm2,温度55～65℃,pH=6.5～7.5.结果表明,W含量质量分数高于44%的镍钨合金镀层结构为非晶态;且在此工艺下易得到钨含量在44%以上的非晶态钨合金镀层.
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| 关 键 词： | 非晶态镍钨合金 电镀 工艺优化 |
| 文章编号： | 1001-1560（2006）12-0023-03 |
| 收稿时间： | 2006-07-24 |
| 修稿时间： | 2006-07-24 |
Electoplating process Amorphous Nickel-Tungsten Alloy Coating |
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| WAN Xiao-bo,ZHANG Lin,ZHOU Lan,XIAO Jiang. Electoplating process Amorphous Nickel-Tungsten Alloy Coating[J]. Journal of Materials Protection, 2006, 39(12): 23-25 |
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| Authors: | WAN Xiao-bo ZHANG Lin ZHOU Lan XIAO Jiang |
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| Abstract: | The electroplating process of amorphous Ni-W alloy coating was studied and optimized. Thus the effects of current density and the pH value and temperature of the plating bath on the composition and microstructure of the alloy coating were investigated , based on analyses of the composition and microstructure of the coating using energy dispersive spectroscopy and X-ray diffraction. It was found that the titled alloy coating with satisfactory composition and microstructure could be prepared by electroplating al a current density of 6. 0 - 12. 0 .A/dm2, bath temperature of 55-65 X. , and bath pH value of 6.5-7.5, with the ra-tio of W ions concentration to that of W ions plus Ni ions to be 0.6-0.8. |
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| Keywords: | amorphous Ni-W alloy electroplating process optimization |
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