1. Institute of Polymer Science and Engineering, National Taiwan University, Taipei 106, Taiwan;2. AGI corporation, Taipei 492, Taiwan;3. Department of Chemical Engineering, National Taiwan University, Taipei 106 TaiwanInstitute of Polymer Science and Engineering, National Taiwan University, Taipei 106, Taiwan. Fax: +886 2 2362 3040;4. Industrial Technology Research Institute, Hsinchu 300, Taiwan
Abstract:
Synthesis, properties, and patterning of new acrylic/silsesquioxane hybrid materials are reported. PMA‐functionalized PHSSQ was synthesized by hydrosilylation and then formulated with acrylate monomer mixtures to yield the photocurable materials. Experiments suggest that the thermal/mechanical properties of the parent acrylic polymers could be significantly enhanced by incorporating nano‐sized silsesquioxane moieties. The refractive index and optical loss were reduced by increasing the silsesquioxane content. The hybrid materials could be photocured and developed a Y‐shape channel pattern; potential applications include uses in patterned electronic and optoelectronic devices.
