Free-charge carrier profile of iso- and aniso-type Si homojunctions determined by terahertz and mid-infrared ellipsometry |
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Authors: | A. Boosalis,T. HofmannJ. &Scaron ik,M. Schubert |
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Affiliation: | a Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68588-0511, USAb ON Semiconductor, Ro?nov pod Radhoštěm, Czech Republic |
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Abstract: | We present an optical, non-destructive, non-contact method of determining the silicon homojunction epilayer free-charge carrier concentration profile and thickness by means of combined terahertz (0.2-1 THz) and mid-infrared (10-50 THz) spectroscopic ellipsometry investigation. A dual homojunction iso- and aniso-type silicon sample is investigated. Application of analytical models for iso-type and aniso-type homojunctions results in an excellent match between calculated and experimental data. Best-match model calculated parameters are found to be consistent with electrical spreading resistance epilayer thickness and resistivity values. |
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Keywords: | Terahertz Isotype Homojunction Silicon Spectroscopic ellipsometry |
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