| 光刻系统用氟化钙晶体的研究进展 |
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| 引用本文： | 董永军,周国清,杨卫桥,苏良碧,徐军. 光刻系统用氟化钙晶体的研究进展[J]. 无机材料学报, 2004, 19(3): 449-455 |
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| 作者姓名： | 董永军 周国清 杨卫桥 苏良碧 徐军 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 上海201800 |
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| 基金项目： | 上海市科技发展基金(022261053) |
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| 摘 要： | 解释了氟化钙晶体能被应用在光刻系统和掀起研究热潮的原因,概述了氟化钙晶体的研究和发展现状,指出了目前氟化钙晶体在研究和发展过程中要解决的重要问题和措施,最后对氟化钙晶体在光刻系统中的发展前景作了展望.
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| 关 键 词： | 氟化钙 晶体 紫外 光刻 157nm 半导体 |
| 文章编号： | 1000-324X(2004)03-0449-07 |
| 收稿时间： | 2003-03-28 |
| 修稿时间： | 2005-05-30 |
Research and Development Status of Calcium Fluoride Crystals Used in Lithography System |
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| DONG Yong-Jun,ZHOU Guo-Qing,YANG Wei-Qiao,SU Liang-Bi,XU Jun. Research and Development Status of Calcium Fluoride Crystals Used in Lithography System[J]. Journal of Inorganic Materials, 2004, 19(3): 449-455 |
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| Authors: | DONG Yong-Jun ZHOU Guo-Qing YANG Wei-Qiao SU Liang-Bi XU Jun |
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| Affiliation: | Shanghai Institute of Optics and Fine Mechanics; Chinese Academy of Sciences; Shanghai 201800; China |
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| Abstract: | The reasons why calcium fluoride crystals can be used in lithography system wereexplaned. The research and development status of calcium fluoride crystals was summarized.Meanwhile the important problems need to be resolved in the process and measures that should betaken into consideration were pointed out. In the end the development foreground was expected. |
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| Keywords: | calcium fluoride crystal UV lithography semiconductor |
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