Demonstration of submicron depletion-mode GaAs MOSFETs withnegligible drain current drift and hysteresis |
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Authors: | Wang Y.C. Hong M. Kuo J.M. Mannaerts J.P. Kwo J. Tsai H.S. Krajewski J.J. Chen Y.K. Cho A.Y. |
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Affiliation: | Lucent Technol., AT&T Bell Labs., Murray Hill, NJ; |
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Abstract: | We successfully fabricated submicron depletion-mode GaAs MOSFETs with negligible hysteresis and drift in drain current using Ga2 O3(Gd2O3) as the gate oxide. The 0.8-μm gate-length device shows a maximum drain current density of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short-circuit current gain cutoff frequency (fT) of 17 GHz and a maximum oscillation frequency (fmax) of 60 GHz were obtained from the 0.8 μm×60 μm device. The absence of drain current drift and hysteresis along with excellent characteristics in the submicron devices is a significant advance toward the manufacture of commercially useful GaAs MOSFETs |
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