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Demonstration of submicron depletion-mode GaAs MOSFETs withnegligible drain current drift and hysteresis
Authors:Wang   Y.C. Hong   M. Kuo   J.M. Mannaerts   J.P. Kwo   J. Tsai   H.S. Krajewski   J.J. Chen   Y.K. Cho   A.Y.
Affiliation:Lucent Technol., AT&T Bell Labs., Murray Hill, NJ;
Abstract:We successfully fabricated submicron depletion-mode GaAs MOSFETs with negligible hysteresis and drift in drain current using Ga2 O3(Gd2O3) as the gate oxide. The 0.8-μm gate-length device shows a maximum drain current density of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short-circuit current gain cutoff frequency (fT) of 17 GHz and a maximum oscillation frequency (fmax) of 60 GHz were obtained from the 0.8 μm×60 μm device. The absence of drain current drift and hysteresis along with excellent characteristics in the submicron devices is a significant advance toward the manufacture of commercially useful GaAs MOSFETs
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