Fabrication of an hermetically packaged silicon resonator on LTCC substrate |
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Authors: | Nguyen Van Toan Hidetoshi Miyashita Masaya Toda Yusuke Kawai Takahito Ono |
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Affiliation: | 1. Graduate School of Engineering, Tohoku University, Sendai, 980-8579, Japan 2. Microsystem Integration Center (μSIC), Tohoku University, Sendai, 980-8579, Japan
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Abstract: | The design, fabrication and packaging process of silicon resonators capable of the integration of LSI (Large Scale Integration) have been developed on the basis of packaging technology using an LTCC (Low Temperature Co-fired Ceramic) substrate. The structures of silicon resonators are defined by deep reactive ion etching (DRIE) on a silicon on insulator (SOI) wafer and then transferred onto the LTCC substrate and hermetically sealed by anodic bonding technique. The measured resonant frequency of a micromechanical bulk acoustic mode silicon resonator after packaging at 0.02 Pa is 20.24 MHz with a quality factor of 50,600. |
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