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Low power flexible organic thin film transistors with amorphous Ba0.7Sr0.3TiO3 gate dielectric grown by pulsed laser deposition at low temperature
Authors:ZR Wang  JZ Xin  XC Ren  XL Wang  CW Leung  SQ Shi  A Ruotolo  PKL Chan
Affiliation:1. Department of Mechanical Engineering, The Hong Kong Polytechnic University, Hung Hom, Hong Kong;2. Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Hong Kong;3. Department of Mechanical Engineering, The Hong Kong University, Pokfulam, Hong Kong;4. Department of Physics and Materials Science, Device Physics Group, City University of Hong Kong, Kowloon Tong, Hong Kong
Abstract:We deposited amorphous Ba0.7Sr0.3TiO3 (BST) on silicon and plastic substrate under 110 °C by pulsed laser deposition (PLD) and use it as the dielectric of the organic transistor. Depends on the thickness of BST layer, the highest mobility of the devices can achieve 1.24 cm2 V?1 s?1 and 1.01 cm2 V?1 s?1 on the silicon and polyethylene naphthalate (PEN) substrate, respectively. We also studied the upward and downward bending tests on the transistors and the dielectric thin films. We found that the BST dielectric pentacene transistor can maintain the mobility at 0.5 cm2 V?1 s?1 or higher while the bending radius is around 3 mm in both upward and downward bending. Our finding demonstrates the potential application of PLD growth high-k dielectric in the large area organic electronics devices.
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