| 氧化铝陶瓷金属化技术的研究进展 |
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| 引用本文： | 马元远,王德苗,任高潮.氧化铝陶瓷金属化技术的研究进展[J].真空电子技术,2007(5):41-43,47. |
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| 作者姓名： | 马元远 王德苗 任高潮 |
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| 作者单位： | 浙江大学,信电系,浙江,杭州,310027 |
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| 摘 要： | 综述了Al2O3陶瓷金属化技术的国内外研究现状与进展,简要介绍了目前主要应用的几种金属化方法,并着重分析了真空溅射镀膜金属化技术中薄膜材料、膜层厚度以及工艺参数对金属化质量的影响。
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| 关 键 词： | Al2O3陶瓷 金属化 真空溅射 |
| 文章编号： | 1002-8935（2007）05-0041-03 |
| 修稿时间： | 2007-05-102007-05-24 |
Progress of Research on the Alumina Ceramics Metallization |
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| MA Yuan-yuan,WANG De-miao,REN Gao-chao.Progress of Research on the Alumina Ceramics Metallization[J].Vacuum Electronics,2007(5):41-43,47. |
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| Authors: | MA Yuan-yuan WANG De-miao REN Gao-chao |
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| Affiliation: | Department of Information Science and Electronics Engineering, Zhejiang University, Hangzhou 310027, China |
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| Abstract: | Recent domestic and international developments of alumina ceramics metallization were reviewed.Several commonly used metallization techniques were introduced.The influence on metallization quality cased by the film material,thickness and technique parameters in vacuum sputtering were analyzed. |
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| Keywords: | Alumina ceramics Metallization Vacuum sputtering |
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