| 侧墙铬衰减型新结构移相掩模的应用 |
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| 引用本文： | 谢常青,刘明,陈宝钦,叶甜春.侧墙铬衰减型新结构移相掩模的应用[J].半导体学报,2006,27(13):340-342. |
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| 作者姓名： | 谢常青 刘明 陈宝钦 叶甜春 |
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| 作者单位： | 中国科学院微电子研究所 纳米加工与新器件集成技术实验室，北京 100029;中国科学院微电子研究所 纳米加工与新器件集成技术实验室，北京 100029;中国科学院微电子研究所 纳米加工与新器件集成技术实验室，北京 100029;中国科学院微电子研究所 纳米加工与新器件集成技术实验室，北京 100029 |
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| 摘 要： | 提出了一种全新的移相掩模--侧墙铬衰减型移相掩模（SCAPSM) ，相对于通常的衰减型移相掩模，其制造工艺仅多两步，却可以较大幅度提高光刻分辨率. 采用PROLITH光学光刻模拟软件，参考ArF步进扫描投影光刻机TWINSCAN XT:1400E的曝光参数，对侧墙铬衰减型移相掩模的工艺进行了研究，证明SCAPSM+离轴照明的方案可以将干式193nm光学光刻的分辨率提高到50nm.
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| 关 键 词： | 193nm光学光刻 衰减型移相掩模 离轴照明 数值孔径 PROLITH |
Application on Sidewall Chrome Attenuated NewStructure Phase Shift Mask |
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| Xie Changqing,Liu Ming,Chen Baoqin and Ye Tianchun.Application on Sidewall Chrome Attenuated NewStructure Phase Shift Mask[J].Chinese Journal of Semiconductors,2006,27(13):340-342. |
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| Authors: | Xie Changqing Liu Ming Chen Baoqin and Ye Tianchun |
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| Affiliation: | Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China |
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| Abstract: | A new type phase shift mask--sidewall chrome attenuated phase shift mask(SCAPSM) is presented.Compared to conventional attenuated phase shift mask,only two process steps are added,but its lithography resolution can be improved greatly.With reference to exposure parameters of ArF scanner TWINSCAN XT:1400E,the SCAPSM exposure process is studied using optical lithography simulation software PROLITH.The resolution of dry 193nm optical lithography can be improved to 50nm when using SCAPSM+OAI. |
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| Keywords: | 193nm optical lithography attenuated phase shift mask off-axis illumination numerical aperture PROLITH |
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