| 微波等离子体化学气相沉积金刚石膜装置的研究进展 |
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| 引用本文： | 黄建良,汪建华,满卫东. 微波等离子体化学气相沉积金刚石膜装置的研究进展[J]. 真空与低温, 2008, 14(1): 1-5 |
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| 作者姓名： | 黄建良 汪建华 满卫东 |
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| 作者单位： | 1. 武汉工程大学,等离子体化学与新材料省重点实验室,湖北,武汉,430073
2. 武汉工程大学,等离子体化学与新材料省重点实验室,湖北,武汉,430073;中国科学院,等离子体物理研究所,安徽,合肥,230031 |
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| 基金项目： | 国家计委新材料领域重大专项项目 |
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| 摘 要： | 综述了各种微波等离子体化学气相沉积（MPCVD）金刚石膜装置的结构及工作原理，并对它们各自的优缺点做了比较分析；基于MPCVD金刚石膜装置的发展现状，构想设计了一种新型高效的大功率大面积快速沉积CVD金刚石膜装置，并对其可行性做了初步分析研究。
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| 关 键 词： | 金刚石膜 微波 化学气相沉积 装置 |
| 文章编号： | 1006-7086(2008)01-0001-05 |
| 修稿时间： | 2007-08-08 |
THE DEVELOPMENT OF APPARATUS TO GROW MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION DIAMOND FILMS |
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| HUANG Jian-liang,WANG Jian-hua,MAN Wei-dong. THE DEVELOPMENT OF APPARATUS TO GROW MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION DIAMOND FILMS[J]. Vacuum and Cryogenics, 2008, 14(1): 1-5 |
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| Authors: | HUANG Jian-liang WANG Jian-hua MAN Wei-dong |
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| Affiliation: | HUANG Jian-liang , WANG Jian-hua , MAN Wei-dong ( 1.Province Key Laboratory of Plasma Chemistry and Advanced Material, Wuhan University of Engineering, Wuhan 430073, China; 2.Institute of Plasma Physics, The Chinese Academy of Sciences, Hefei 230031, China) |
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| Abstract: | An overview on structure and work principium of various apparatus to grow microwave plasma chemical vapor deposition diamond films and also compare and analyze their virtue and flaw separately;Based on these actuality, it design a new apparatus to rapidly grow chemical vapor deposition diamond fdms under large power and area,and approximately analyze the feasibility of this apparatus. |
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| Keywords: | diamond films microwave plasma chemical vapor deposition apparatus |
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