Co-deposition of Al-Cr-Ni alloys using constant potential and potential pulse techniques in AlCl3-NaCl-KCl molten salt

To improve the oxidation resistance of TiAl intermetallic compound under high temperature condition, cathodic co-deposition of Al-Cr and Al-Ni alloy was carried out by constant potential control or potential pulse control in AlCl₃-NaCl-KCl molten salt containing CrCl₂ and/or NiCl₂ at 423 K. Cathodic reduction of Ni and Cr starts at potential of 0.8 and 0.15 V versus Al/Al³⁺ in the molten salt, respectively. The co-deposition of Al, Cr, and Ni occurred at potentials more negative than −0.1 V to form a mixture of intermetallic compounds of Cr₂Al, Ni₃Al, and Al₃Ni. Concentration of Cr in the deposit was enhanced to 43 at% at −0.1 V; however, concentration of Ni in the deposit was 6 at% at the same potential. The concentration of Ni further decreased with more negative potential to 1 at% at −0.4 V. The potential pulse technique enhanced the Ni concentration in the deposit to about 30 at%, due to anodic dissolution of Al content from the deposit at the higher side of potential on the potential pulse electrolysis.