Characterization of light-emitting diodes based on InAsSbP/InAsSb structures grown by metal-organic vapor-phase epitaxy

Light-emitting diodes for the wavelength range λ=3.3–4.5 µm were fabricated on the basis of InAsSbP/InAsSb heterostructures grown by metal-organic vapor-phase epitaxy. The use of vapor-phase epitaxy made it possible to appreciably increase the phosphorus content in barrier layers (up to 50%) in comparison with that attainable in the case of liquid-phase epitaxy; correspondingly, it was possible to improve confinement of charge carriers in the active region of the structures. Photoluminescent properties of InAsSb layers, electroluminescent properties of light-emitting diodes, and dependences of the emission power on current were studied. Two types of light-emitting diodes were fabricated: (i) with extraction of emission through the substrate (type A) and (ii) with extraction of emission through the epitaxial layer (type B). The light-emitting diodes operating in the pulse mode (with a relative pulse duration of 20) had an emission power of 1.2 mW at room temperature.