| 低温电沉积硅工艺研究进展 |
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| 引用本文： | 巫亮,赵占霞,张承龙.低温电沉积硅工艺研究进展[J].有色金属(冶炼部分),2019(10):67-73. |
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| 作者姓名： | 巫亮 赵占霞 张承龙 |
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| 作者单位： | ;1.上海大学理学院物理系;2.上海第二工业大学电子废弃物研究中心 |
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| 基金项目： | 国家自然科学基金资助项目（51474146）；上海市高原学科—环境科学与工程(资源循环科学与工程)资助项目；上海第二工业大学校重点学科（XXKZD1602） |
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| 摘 要： | 半导体硅的传统制备工艺主要有直拉法、区熔法及气相沉积法等,这些制备工艺都需要在高温下进行,且涉及到大型设备,制备成本较高,操作较为复杂。采用低温电沉积法制备硅具有简单可控、低成本的特点,因而受到了研究者青睐。主要从电极、溶剂的选取及电沉积方法等方面阐述了低温电沉积硅工艺研究现状,同时对低温电沉积硅存在的问题和发展趋势进行了讨论。
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| 关 键 词： | 低温 电沉积 硅 工艺 进展 |
| 收稿时间： | 2019/4/9 0:00:00 |
| 修稿时间： | 2019/5/9 0:00:00 |
Research Progress of Electrodeposited Silicon Technology at Low Temperature |
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| WU Liang,ZHAO Zhan-xia and ZHANG Cheng-long.Research Progress of Electrodeposited Silicon Technology at Low Temperature[J].Nonferrous Metals(Extractive Metallurgy),2019(10):67-73. |
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| Authors: | WU Liang ZHAO Zhan-xia and ZHANG Cheng-long |
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| Affiliation: | Department of Physics,Shanghai University,, |
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| Abstract: | Traditional preparation processes of silicon mainly include Czochralski, zone melting and vapor deposition method. Operation of these methods needs high temperature, large-scale equipments, complicated operation and high cost. Electrodeposited silicon at low temperature is favored by researchers due to its advantages of simple, controllable and low-cost preparation. Research status of low temperature electrodeposited silicon process is comprehensive overviewed, including selection of electrode and solvent, and electrodeposition method. Furthermore, Problems and development trends of low temperature electrodeposited silicon are discussed. |
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| Keywords: | low temperature electrodeposition silicon technology process |
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