Rapid synthesis of few-layer graphene over Cu foil |
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Authors: | A. Kumar A.A. Voevodin D. Zemlyanov D.N. Zakharov T.S. Fisher |
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Affiliation: | 1. Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47907, United States;2. Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, United States |
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Abstract: | We report a unique process for rapid synthesis of few-layer graphene films on Cu foil by microwave plasma chemical vapor deposition (MPCVD). We show that the plasma/metal interaction can be advantageous for a rapid synthesis of such thin films. The process can produce films of controllable quality from amorphous to highly crystalline by adjusting plasma conditions during growth processes of ~100 s duration and with no supplemental substrate heating. Films have been characterized using Raman spectroscopy, scanning electron microscopy, transmission electron microscopy and X-ray photoelectron spectroscopy. The results help to identify the stages involved in the MPCVD deposition of thin carbon films on Cu foil, and the findings open new pathways for a rapid growth of few-layer graphene films. |
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