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Study on residual stress in viscoelastic thin film using curvature measurement method
Authors:Young?Tae?Im  Email author" target="_blank">Seung?Tae?ChoiEmail author  Tae?Sang?Park  Jae?Hyun?Kim
Affiliation:(1) Department of Mechanical Engineering, ME3053, KAIST,Science Town, 305-701 Daejeon, Korea;(2) Micro system & Structural Mechanics Group, KIMM Korea Institute of Machinery and Materials, 171 Jang- dong, Yusung-ku, Daejeon, 305-343, Korea
Abstract:Using LSM (laser scanning method), the radius of curvature due to thermal deformation in polyimide film coated on Si substrate is measured. Since the polyimide film shows viscoelastic behavior, i.e., the modulus and deformation of the film vary with time and temperature, we estimate the relaxation modulus and the residual stresses of the polyimide film by measuring the radius of curvature and subsequently by performing viscoelastic analysis. The residual stresses relax by an amount of 10% at 100°C and 20% at 150°C for two hours.
Keywords:Residual Stress  Curvature  Viscoelastic  Elastic-Viscoelastic Correspondence Principle  CTE Mismatch
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