A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate |
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Authors: | Sang-Jin Cho Jin-Hyo Boo |
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Affiliation: | (1) Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon, 440-746, South Korea |
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Abstract: | Nitrogen-doped thiophene plasma polymer N-ThioPP] thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced
chemical vapor deposition method. Thiophene was used as organic precursor (carbon source) with hydrogen gas as the precursor
bubbler gas. Additionally, nitrogen gas N2] was used as nitrogen dopant. Furthermore, additional argon was used as a carrier gas. The as-grown polymerized thin films
were analyzed using ellipsometry, Fourier-transform infrared FT-IR] spectroscopy, Raman spectroscopy, and water contact angle
measurement. The ellipsometry results showed the refractive index change of the N-ThioPP film. The FT-IR spectra showed that
the N-ThioPP films were completely fragmented and polymerized from thiophene. |
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Keywords: | PECVD plasma polymer N-ThioPP optical physical and chemical properties |
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