Growth and characterization of new oxide and fluoride crystals for optical applications |
| |
Authors: | K Shimamura S L Baldochi N A Mujilatu K Nakano T Fukuda |
| |
Affiliation: | (1) Institute for Materials Research, Tohoku University, 980-8577 Sendai, Japan;(2) Instituto de Pesquisas Energeticas e Nucleares, SP, Brazil |
| |
Abstract: | High quality oxide and fluoride single crystals for optical applications have been grown by the Czochralski technique. Lattice parameter investigation of grown Gd3Yb x Ga5−x O12 suggested that this crystal will be a superior material as substrate for optical isolators with large Faraday effect. Growth conditions of (La,Sr)(Al,Ta)O3 single crystals are discussed. These crystals have excellent lattice matching with GaN, a promising material for optoelectronic devices. Ce-doped fluoride single crystals—LiCaAIF6, LiYF4 and BaLiF3—have been grown for solid state UV laser applications. Growth results and optical characterization are discussed. |
| |
Keywords: | Crystal growth Czochralski method oxides fluorides UV lasers |
本文献已被 SpringerLink 等数据库收录! |
|