双束沉积ZrO_x薄膜时O~+束流密度对其折射率的影响

双离子束技术制备薄膜有以下几个特点:(1)沉积工艺参数可分别调节、控制,相互牵制性小,因而可自动控制程序进行薄膜的制备,从而提高了重复性;(2)由于离子轰击的混合效应,薄膜与基体具有很好的结合强度;(3)离子束能量的适当选择以及辅以加热等手段,可容

Optical zirconia films produced by using dual ion beam technology

Optical ZrO2 films produced with dual ion beam technology are reported for the first time. The dependence of deposition process on oxygen-to-zirconium composition ratio and the corresponding refractive index of the film are given in this paper, and the optimum conditions for the depositon process are suggested on the basis of the analyses of RBS, XPS, XRD and TEM.