| 用交流孪生靶磁控反应溅射法制备ITO薄膜 |
| |
| 引用本文： | 赵印中,王洁冰,邱家稳,许旻,李强勇. 用交流孪生靶磁控反应溅射法制备ITO薄膜[J]. 真空与低温, 2003, 9(1): 13-16,34 |
| |
| 作者姓名： | 赵印中 王洁冰 邱家稳 许旻 李强勇 |
| |
| 作者单位： | 兰州物理研究所,甘肃,兰州,730000 |
| |
| 摘 要： | 采用氧化铟锡(ITO)陶瓷靶(质量分数为90%的In2O3与10%的SnO2)作为溅射源,通过交流孪生靶反应磁控溅射制备出了性能优良的ITO薄膜,其光谱透射率大于85%。结合对所镀制ITO薄膜的表面形貌及化学成分分析,研究了反应气体流量、退火等工艺参数对ITO薄膜光学和电学性能的影响。
|
| 关 键 词： | 孪生靶磁控溅射 ITO 透明导电 |
| 文章编号： | 1006-7086(2003)01-0013-04 |
| 修稿时间： | 2003-01-06 |
REACTIVE SPUTTERING OF INDIUM TIN OXIDE THIN FILMS USING AC TWIN-TARGET |
| |
| ZHAO Yin|zhong,WANG Jie|bing,QIU Jia|wen,XU Min,LI Qiang|yong. REACTIVE SPUTTERING OF INDIUM TIN OXIDE THIN FILMS USING AC TWIN-TARGET[J]. Vacuum and Cryogenics, 2003, 9(1): 13-16,34 |
| |
| Authors: | ZHAO Yin|zhong WANG Jie|bing QIU Jia|wen XU Min LI Qiang|yong |
| |
| Abstract: | Thin films of indium tin oxide have been prepared by AC Twin|target reactive sputtering from indium tin oxide ceramics targets. The optical transmittance of samples exceeds 85%. The effect of technics parameters on the properties of indium tin oxide thin films has been studied.; |
| |
| Keywords: | twin-target sputtering ITO electrically conductive and optically transparent |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
