Fluorine Passivation in Gate Stacks of Poly-Si/TaN/HfO2 (and HfSiON/HfO2)/Si Through Gate Ion Implantation |
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| Authors: | Zhang M H Zhu F Kim H S Ok I J Lee J C |
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| Affiliation: | Texas Mater. Inst., Univ. of Texas, Austin, TX; |
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| Abstract: | Fluorine passivation in poly-Si/TaN/HfO2/p-Si and poly-Si/TaN/HfSiON/HfO2/p-Si gate stacks with varying TaN thickness through gate ion implantation has been studied. It has been found that when TaN thickness was less than 15 nm, mobility and subthreshold swing improved significantly in HfO2 nMOSFETs; while there was little performance improvement in HfSiON/HfO2 nMOSFETs due to the blocking of F atoms by the HfSiON layer in gate dielectrics, as has been proved by the electron energy loss spectroscopy mapping |
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