| HR-ICP-MS测定电子级N-甲基吡咯烷酮中痕量金属杂质 |
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| 引用本文： | 郝萍,李春华.HR-ICP-MS测定电子级N-甲基吡咯烷酮中痕量金属杂质[J].上海计量测试,2020(2):2-5. |
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| 作者姓名： | 郝萍 李春华 |
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| 作者单位： | 上海市计量测试技术研究院 |
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| 基金项目： | 上海市科学技术委员会科研计划项目(18142203300)。 |
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| 摘 要： | 文章采用高分辨电感耦合等离子体质谱仪(HR-ICP-MS)检测电子级N-甲基吡咯烷酮(NMP)中金属杂质元素,采用标准加入法进行定量测试,回收率为92.40%~110.25%,重复性相对标准偏差为0.19%~3.78%,检测限满足电子级NMP中金属杂质含量在0.1~1μg/kg级别测试需求。
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| 关 键 词： | 电子级N-甲基吡咯烷酮 等离子体质谱仪 痕量金属杂质 标准加入法 |
Determination of trace metal impurities in electronic-grade N-methyl pyrrolidone by HRICP-MS |
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| Hao Ping,Li Chunhua.Determination of trace metal impurities in electronic-grade N-methyl pyrrolidone by HRICP-MS[J].Shanghai Meassurement and Testing,2020(2):2-5. |
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| Authors: | Hao Ping Li Chunhua |
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| Affiliation: | (Shanghai Institute of Measurement and Testing Technology) |
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| Abstract: | In this paper,high resolution inductively coupled plasma mass spectrometry(HR-ICP-MS)was used to detect metal impurities in electronic NMP.The standard addition method was used for quantitative test.The recovery was 92.40%-110.25%,the relative standard deviation of repeatability was 0.19%-3.78%,and the detection limit met the requirement of 0.1-1μg/kg level of metal impurities in electronic NMP. |
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| Keywords: | Electronic-grade N-methyl pyrrolidone HR-ICP-MS trace metalimpurities standard addition method |
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