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Mg/PTFE薄膜制备与性能表征
引用本文:刘桂林,李国新,王广海,劳允亮. Mg/PTFE薄膜制备与性能表征[J]. 含能材料, 2010, 18(2): 205-208. DOI: 10.3969/j.issn.1006-9941.2010.02.018
作者姓名:刘桂林  李国新  王广海  劳允亮
作者单位:北京理工大学爆炸科学与技术国家重点实验室,北京,100081;北京理工大学爆炸科学与技术国家重点实验室,北京,100081;北京理工大学爆炸科学与技术国家重点实验室,北京,100081;北京理工大学爆炸科学与技术国家重点实验室,北京,100081
摘    要:以镁(Mg)为可燃物质,聚四氟乙烯(PTFE)为氧化剂,利用磁控溅射和真空蒸镀两种方法,制备薄膜烟火器件,研究两种制膜工艺在性能上的差异,并对其附着力、薄膜粒度和燃速进行了测量。结果表明,磁控溅射制得的薄膜附着力为35.88mN,粒度为0.1~0.5μm,燃速为(623.9±12.5)mm.s-1,其主要性能优于真空蒸镀法制得的薄膜。

关 键 词:武器系统与运用工程  Mg/PTFE薄膜  火工品  真空蒸镀  磁控溅射
收稿时间:2009-06-03
修稿时间:2009-12-06

Preparation and Properties of Mg/PTFE Thin Film
LIU Gui-lin,LI Guo-xin,WANG Guang-hai and LAO Yun-liang. Preparation and Properties of Mg/PTFE Thin Film[J]. Chinese Journal of Energetic Materials, 2010, 18(2): 205-208. DOI: 10.3969/j.issn.1006-9941.2010.02.018
Authors:LIU Gui-lin  LI Guo-xin  WANG Guang-hai  LAO Yun-liang
Affiliation:State Key Laboratory of Explosion Science and Technology, Department of Mechatronic Engineering, Beijing Institute of Technology, Beijing 100081, China;State Key Laboratory of Explosion Science and Technology, Department of Mechatronic Engineering, Beijing Institute of Technology, Beijing 100081, China;State Key Laboratory of Explosion Science and Technology, Department of Mechatronic Engineering, Beijing Institute of Technology, Beijing 100081, China;State Key Laboratory of Explosion Science and Technology, Department of Mechatronic Engineering, Beijing Institute of Technology, Beijing 100081, China
Abstract:Mg/PTFE thin film pyrotechnic was produced by magnetron sputtering and evaporated deposition using magnesium as the combustible and polytetrafluoroethylene as the oxidant. The differences of the two film technologies were investigated and the adhesion,the granularity and the burning rate of the thin film were measured. Results show that the adhesion,the granularity and the burning rate of the Mg/PTFE film produced by magnetron sputtering are 35.88 mN,0.1-0.5 μm and (623.9±12.5) mm·s~(-1) respectively,and the main performances of the Mg/PTFE film produced by magnetron sputtering are better than that by evaporated deposition.
Keywords:weapon system and application engineering  Mg/PTFE thin film  pyrotechnics  evaporated deposition  magnetron sputtering
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