Electrodeposited TiB2 on graphite as wettable cathode for Al production

Titanium diboride (TiB₂) is considered as a promising cathode material for Al production. However, the manufacture of TiB₂ cathodes is facing numerous challenges. In this study, electrodeposition of TiB₂ on graphite was performed in molten fluoride (FLiNaK) electrolyte at 600°C by using a periodically interrupted current technique for various electrodeposition times (from 10 to 75 minutes) and at two different current densities (?0.12 and ?0.5 A/cm²). It is shown that the TiB₂ coating morphology/microstructure strongly depends on the applied current density. Denser coatings were obtained at j_on = ?0.12 A/cm² with a growth rate of ca. 0.7 µm/min. The thicker films display a preferential crystallographic orientation along the 110] plan. At j_on = ?0.5 A/cm², TiB₂ coatings are deposited at a growth rate of ca. 6 µm/min with no crystallographic texture. They present a porous and stratified morphology with numerous transversal macrocracks. All TiB₂ coatings show excellent wettability for molten Al as confirmed by sessile drop experiments. However, significant molten Al infiltration occurs in the TiB₂ coatings, which accumulates at the coating/graphite interface, inducing the coating delamination.