Tailoring of the plasmonic and waveguide effect in bulk-heterojunction photovoltaic devices with ordered,nanopatterned structures |
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| Authors: | Dong Hwan Wang Aung Ko Ko Kyaw Qing Guo Du Dae-Geun Choi Jong Hyeok Park |
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| Affiliation: | 1. School of Integrative Engineering, Chung-Ang University, 84 Heukseok-Ro, Dongjak-gu, Seoul 156-756, Republic of Korea;2. Institute of Materials Research and Engineering, Agency for Science Technology and Research (A∗STAR), Singapore 117602, Republic of Singapore;3. Institute of High Performance Computing, 1 Fusionopolis Way, #16-16 Connexis North, Singapore 138632, Republic of Singapore;4. Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Republic of Korea;5. School of Chemical Engineering and SAINT, Sungkyunkwan University, Suwon 440-746, Republic of Korea |
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| Abstract: | Various nano-patterned bulk-heterojunction (BHJ) films with different diameters and pitches were fabricated by a stamping method to tailor the plasmonic effect. The nanopatterned BHJ active layers exhibit regular-ordered embossing structures, which were confirmed by the surface morphological analysis with SEM and AFM. The simulation results confirm that devices with nanopatterned BHJ film with a diameter/pitch of 265/400 nm exhibit a strong improvement in E-field distribution intensity due to the combination of the plasmonic and waveguide modes compared to devices without a nanopattern, with 150/400 nm, or with 265/800 nm, which led to increased JSC and cell efficiency in J–V curves under solar light illumination. The optimized plasmonic effect plays an important role in the light harvesting of BHJ devices. |
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| Keywords: | Bulk-heterojunction Nano-pattern Stamping process Photovoltaic devices Plasmonic and waveguide effect |
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