| 物理气相沉积镀渗新工艺 |
| |
| 引用本文： | 王永康,刘智勇.物理气相沉积镀渗新工艺[J].兵器材料科学与工程,1993,16(6):65-67. |
| |
| 作者姓名： | 王永康 刘智勇 |
| |
| 作者单位： | 五二研究所宁波分所，五二研究所宁波分所，五二研究所宁波分所 宁波市303信箱 315040 |
| |
| 摘 要： | 在物理气相沉积镀层工艺基础上发展了镀渗新工艺。文中研究了物理气相沉积镀渗新工艺的镀渗层特征及涂层工艺。
|
| 关 键 词： | 物理气相沉积 镀层 渗层 |
NEW PVD COATING & DIFFUSING TECHNIQUE |
| |
| Wang Yongkang,Liu Zhiyong,Wang Weimin,Gu Xiaohong.NEW PVD COATING & DIFFUSING TECHNIQUE[J].Ordnance Material Science and Engineering,1993,16(6):65-67. |
| |
| Authors: | Wang Yongkang Liu Zhiyong Wang Weimin Gu Xiaohong |
| |
| Abstract: | A new technique was developed on the bases of PVD costing and PVD diffusing technique. The properties of the coating and diffusing layer and the experimental process have been studied in this paper. |
| |
| Keywords: | PVD plasma coating plasma diffusing |
| 本文献已被 CNKI 维普 等数据库收录！ |
