| IC制造中清洗技术发展的分析 |
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| 引用本文： | 盛金龙. IC制造中清洗技术发展的分析[J]. 半导体技术, 2006, 31(3): 166-169 |
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| 作者姓名： | 盛金龙 |
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| 作者单位： | 北京七星华创电子股份有限公司,北京,100016 |
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| 摘 要： | 概述了半导体制造中清洗技术所面临的挑战及生产中存在的问题,分析了解决问题的途径,讨论了当前IC制造中关键清洗技术的发展方向.对于国产清洗设备制造业的发展提出了自己的看法.
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| 关 键 词： | IC制造 清洗技术 挑战 |
| 文章编号： | 1003-353(2006)03-0166-04 |
| 收稿时间： | 2006-01-25 |
| 修稿时间： | 2006-01-25 |
Analysis of Development for Cleaning Technique on IC Manufacture |
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| SHENG Jin-long. Analysis of Development for Cleaning Technique on IC Manufacture[J]. Semiconductor Technology, 2006, 31(3): 166-169 |
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| Authors: | SHENG Jin-long |
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| Affiliation: | Beijing Sevenstar Huachuang Elecronics Co.,Ltd., Beijing 100016, China |
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| Abstract: | The new challenge and issues of the cleaning technique in IC manufacturing are introduced. The ways for solving the problems are analyzed, and the key techniques developing trends are discussed. Suggestions for developing cleaning equipment were proposed. |
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| Keywords: | IC manufacture cleaning technique challenge |
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