| Ti-N涂层晶体择优取向的电子衍射法研究 |
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| 引用本文： | 闻立时,姜辛,斯重遥.Ti-N涂层晶体择优取向的电子衍射法研究[J].无机材料学报,1986(4). |
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| 作者姓名： | 闻立时 姜辛 斯重遥 |
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| 作者单位： | 中国科学院金属研究所 沈阳市
(闻立时，姜辛)，中国科学院金属研究所 沈阳市(斯重遥) |
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| 摘 要： | 对用电子衍射法研究涂层晶体择优取向进行了尝试。首先从晶体电子衍射的基本原理出发从方法上进行探讨,然后用 Ti-N 涂层进行检验,给出了较为精确的结果。并将 X 射线衍射技术作为辅助手段研究了工艺参数对 Ti-N 涂层晶体择优取向的影响。
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| 关 键 词： | Ti-N 涂层 晶体 择优取向 电子衍射 |
Electron Diffraction Study on Preferred Orientaton of Ti-N Coatings |
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| Wen Lishi Jiang Xin Si Chongyao.Electron Diffraction Study on Preferred Orientaton of Ti-N Coatings[J].Journal of Inorganic Materials,1986(4). |
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| Authors: | Wen Lishi Jiang Xin Si Chongyao |
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| Abstract: | A simplified method for determining the preferred orientation of thin films by usingelectron diffraction was suggested.The method was analysed based on the principle ofelectron diffraction in crystal and checked experimentally with Ti-N coatings.Using thismethod in combination with X-ray diffraction,the effects of process parameters on thepreferred crystallographic orientation of Ti-N coatings were studied. |
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| Keywords: | Ti-N coating Crystal Preferred orientation Electron diffraction |
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