| 灰度掩模并行激光直写系统的总体设计 |
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| 引用本文： | 颜树华,戴一帆,等.灰度掩模并行激光直写系统的总体设计[J].光电子．激光,2002,13(6):559-562. |
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| 作者姓名： | 颜树华 戴一帆 |
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| 作者单位： | 国防科技大学机电工程与自动化学院,湖南,长沙,410073 |
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| 基金项目： | 国家自然科学基金资助项目 (5 0 0 0 5 0 2 2 |
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| 摘 要： | 灰度掩模法是一种新的二元光学器件制做方法。研究了并行激光直写高性能灰度掩模的工作原理，对空间光调制器（SML）、精缩投影物镜和二维气浮平台等关键单元进行了分析，给出了并行激光直写系统的主要技术指标和初步实验结果。
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| 关 键 词： | 二元光学 并行激光直写 灰度掩模 空间光调制器 设计 |
| 文章编号： | 1005-0086(2002)06-0559-04 |
| 修稿时间： | 2001年11月28 |
General Design of Parallel Laser Direct Writing System for Manufacturing Gray-scale Masks |
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| YAN Shu hu,DAI Yi fan,LU Hai bao,LI Sheng yi.General Design of Parallel Laser Direct Writing System for Manufacturing Gray-scale Masks[J].Journal of Optoelectronics·laser,2002,13(6):559-562. |
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| Authors: | YAN Shu hu DAI Yi fan LU Hai bao LI Sheng yi |
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| Abstract: | Gray scale mask method is a novel way of fabricating binary optical elements.In this paper,the working principle about parallel laser direct writing gray scale masks of high quality was analyzed.In the parallel laser direct writing systm,some crucial units such as spatial light modulator (SLM),projection objective and two dimensional air bearing stage were studied in detail.Then its main technical indexes and initial experimental results were provided. |
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| Keywords: | Binary optics Parallel laser direct writing system Gray scale mask Spatial Light Modulator(SLM) |
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