| 压力对热丝化学气相沉积的CH4/H2/Ar气氛中的纳米金刚石薄膜生长的影响 |
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| 引用本文： | 杨树敏,贺周同,朱德彰,巩金龙,周兴泰. 压力对热丝化学气相沉积的CH4/H2/Ar气氛中的纳米金刚石薄膜生长的影响[J]. 功能材料与器件学报, 2009, 15(4) |
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| 作者姓名： | 杨树敏 贺周同 朱德彰 巩金龙 周兴泰 |
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| 作者单位： | 上海应用物理研究所,中国科学院,上海,201800;中国科学院研究生院,北京,100049;上海应用物理研究所,中国科学院,上海,201800 |
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| 基金项目： | Key Project of Chinese Academy of Sciences Knowledge Innovation Program(Grant No.KJCX3.SYW.N10);;the National Natural Science Foundation of China(Grant No.10375085) |
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| 摘 要： | 在热丝化学气相沉积体系中,系统研究了气压对CH4/H2/Ar气氛中纳米金刚石薄膜生长的影响.研究发现,体系气压对纳米金刚石的生长有很大的影响.在40torr的气压下,在CH4/H2/Ar气氛中的Ar气含量需高达90%才能保证纳米金刚石薄膜的生长,但降低气压至5torr时,50%的Ar气含量即可保证纳米金刚石薄膜的生长.压力对薄膜生长表面的气体浓度的影响是这个转变的主要原因.在同样的Ar含量下,在5torr下的C2活性基团的浓度高于40 torr的浓度,因而低的Ar含量会保证纳米金刚石薄膜的生长.
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| 关 键 词： | 纳米金刚石薄膜 热丝化学气相沉积 压力 Ar浓度 |
Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH_4/H_2/Ar gas mixture |
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| YANG Shu-min,HE Zhou-tong,ZHU De-zhang,GONG Jin-long,ZHOU Xing-tai. Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH_4/H_2/Ar gas mixture[J]. Journal of Functional Materials and Devices, 2009, 15(4) |
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| Authors: | YANG Shu-min HE Zhou-tong ZHU De-zhang GONG Jin-long ZHOU Xing-tai |
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| Affiliation: | 1.Shanghai Institute of Applied Physics;Chinese Academy of Sciences;Shanghai 201800;China;2.Graduate School of the Chinese Academy of Sciences;Beijing 100049;China |
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| Abstract: | The effect of pressure on the deposition of nanocrystalline diamond(NCD) films in a hot filament chemical vapor deposition(HFCVD) system was investigated using CH4/H2/Ar gas mixture.The reactor pressure was found to have the strongest influence on nucleation of nanocrystalline diamond films.The range of Ar concentration in the CH4/H2/Ar mixture that permits the deposition of nanocrystalline diamond(NCD) film at 40 torr is 90%,while the Ar concentration needed for the transition into nanocrystalline diamond ... |
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| Keywords: | nanoerystalline diamond films HFCVD pressure Ar concentration |
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