Observation of Hydrogenated Amorphous Carbon Films by Atomic Force Microscopy |
| |
| Authors: | Yoshikazu Nakamura Yoshihisa Watanabe Yoshihito Suefuji Shigekazu Hirayama |
| |
| Affiliation: | Department of Materials Science and Engineering, National Defense Academy, Yokosuka, Kanagawa 239, Japan |
| |
| Abstract: | Atomic force microscopy images were made of the surface of CVD hydrogenated amorphous carbon films. The films were deposited from toluene vapor with oxygen additions during deposition, producing very smooth surfaces. Average roughnesses of only 0.5 nm were measured for the films made with oxygen, whereas a surface roughness of 11 nm was obtained for the films deposited without oxygen. The results suggest that sp 2- and sp 3-bonded carbons were removed by oxygen rosion for CVD hydrogenated amorphous carbon films deposited in the presence of oxygen. |
| |
| Keywords: | |
|
|
