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| PREPARATION AND SURFACE CHARACTERIZATION OF TiO_2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD | |
| 引用本文： | L.S.Yin1,3),H. Shen2) and J.X. Zhang3) 1)College of Information Engineering,Central South University,Changsha 410075,China 2)Guangzhou Institute of Energy Conversion,CAS,Guangzhou 510070,China 3)Department of Physics,Zhongshan University,Guang. PREPARATION AND SURFACE CHARACTERIZATION OF TiO_2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD[J]. 金属学报(英文版), 2002, 15(2): 207-209 |
| 作者姓名： | L.S.Yin1 3) H. Shen2) and J.X. Zhang3) 1)College of Information Engineering Central South University Changsha 410075 China 2)Guangzhou Institute of Energy Conversion CAS Guangzhou 510070 China 3)Department of Physics Zhongshan University Guang |
| 作者单位： | L.S.Yin1，3)，H. Shen2) and J.X. Zhang3) 1)College of Information Engineering，Central South University，Changsha 410075，China 2)Guangzhou Institute of Energy Conversion，CAS，Guangzhou 510070，China 3)Department of Physics，Zhongshan University，Guang |
| 基金项目： | The authors would like to thank the Hundred Talents Project of The Chinese Academy of Sciences，Science and Technology Committ |
| 摘 要： | 1. IntroductionTiOz thin films have excellent properties sucl1 as l1igh ref1actitre il1dex, outstal1diugoptical tra11sl11ittallce, high dielectric constant and physical chemical stabilityll'2]. Recently',the TiO2 thi1l films have drawn more attel1tions oll photocatalysis, optical coating, al1dsolar cell fab.ication[3'4l. In this work we deposited Ti thin film on glass substrate b}-nlagl1etroll sputterillg lllethod and allllealing Ti tl1in fi1l11 to fOrlll TiO2 tl1ill fi1m.2. ExperimelltalT… |
PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD |
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| L.S.Yin,H.Shen,J.X.Zhang. PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD[J]. Acta Metallurgica Sinica(English Letters), 2002, 15(2): 207-209 | |
| Authors: | L.S.Yin H.Shen J.X.Zhang |
| Affiliation: | 1. College of Information Engineering,Central Sonth University,Changsha 410075,China;Department of Physics,Zhongshan University,Guangzhou 510275,China 2. Guangzhou Institute of Energy Conversion,CAS,Guangzhou 510070,China 3. Department of Physics,Zhongshan University,Guangzhou 510275,China |
| Abstract: | Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films. |
| Keywords: | TiO2. thin film. magnetron sputtering |
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