Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions |
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| Authors: | S. Sood R. Peelamedu K. B. Sundaram E. Dein R. M. Todi |
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| Affiliation: | (1) School of Electrical Engineering and Computer Science, University of Centeral Florida, 4000 Centeral Florida, Orlando, FL 32828, USA;(2) Advanced Materials Processing and Analysis Center, University of Central Florida, Orlando, FL 32816, USA |
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| Abstract: | In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/ H2O2 and KOH/H2O2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants. |
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