X射线源针孔成像系统优化设计研究

为提高X射线源针孔成像系统的性能，对成像能区为10~100 keV的X射线源针孔成像系统进行了优化设计研究。综合应用了理论分析和蒙特卡罗模拟的方法，首先根据X射线波长、准直器角响应和X射线穿透效应对针孔成像的不同影响结果设计了可有效控制成像分辨率和成像面积变化的船底型准直器，随后用蒙特卡罗方法对使用该准直器的针孔成像系统进行了模拟验证。结果表明，对于100 keV以下的X射线，经船底型准直器后，成像的空间分辨率和亮斑亮度较稳定，能得到相对准确的X射线源定位、定量信息。

Study on Optimization Design of X-ray Source Pinhole Imaging System

In order to improve the performance of the X-ray source pinhole imaging system, the study on the optimization design of the pinhole imaging system for X-ray source in 10-100 keV was carried out with both theoretical analysis and Monte Carlo simulation. The wavelength and penetration effect of X-ray and angle response of collimator have different influences on the results of the pinhole imaging system. Based on those results, a bottom-shell-like collimator was designed to control the variation of imaging resolution and area. Then the pinhole imaging system with the collimator was verified with Monte Carlo simulation. The results show that the collimator can get the stable imaging resolution and spot brightness, and the relatively accurate orientation and quantitative information of X-ray source below 100 keV can be obtained.