Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs |
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Authors: | Teh Y Tan |
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Affiliation: | Max Planck Institute of Microstructure Physics, Weinberg 2, 02160, Halle, Germany |
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Abstract: | For the Ga sublattice of GaAs, the recent understanding of the impurity and self-diffusion mechanisms and the nature of the point defects responsible are discussed. Analyses of doping enhanced AlAs/GaAs superlattice disordering data and impurity diffusion data have led to the conclusion that, under thermal equilibrium and intrinsic conditions, the triply-negatively-charged Ga vacancy ((VGa3?) governs Ga self-diffusion and Al---Ga interdiffusion in As-rich crystals, while the doubly-positively-charged Ga self-interstitial (IGa2+) dominates in Ga-rich crystals. When doped sufficiently, dominates in n-type crystals, while IGa2+ dominates in p-type crystals, irrespective of the crystal composition. The VGa3? species also contributes to the diffusion of the main donor species Si, while IGa2+ also governs the diffusion of the main acceptor species Zn and Be via the kick-out mechanism. The thermal equilibrium concentration of VGa3? (CVGa3?) has been found to exhibit a temperature independence or even a small negative temperature dependence in that, when the temperature is lowered, CVGa3?; is either unchanged or even slightly increases. This CVGa3? behavior is consistent with many outstanding experimental results. |
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Keywords: | Gallium arsenide Point defects Diffusion mechanisms |
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