An extension of the ideal diode analysis for the heavily doped p-n diode |
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Authors: | KW Teng SS Li W Krull |
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Affiliation: | Department of Electrical Engineering, University of Florida, Gainesville, FL 32611, U.S.A. |
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Abstract: | In this paper, an extension of the ideal-diode analysis for the heavily-doped p-n junction diode is proposed. The heavy doping effects such as carrier degeneracy and band gap narrowing are accounted for by using a tractable empirical approximation for the reduced Fermi-energy given by12] and employing effective intrinsic density. Under the assumption of low-level injection, it is found that the injected minority-carrier current, and the charge storage in the quasi-neutral regions should depend exponentially on values of F(Y), where F(Y) is a function of dopant dentisy at the depletion edge of the quasi-neutral emitter (or) base region of the p-n junction. Results of our calculations of excess hole current for the short base and the long-base diode show significant change from the values predictged by the conventional diode theory. |
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