Physical modeling of hole mobility in silicon inversion layers under uniaxial stress |
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Authors: | Ji Zhao Yaohua Tan Jianping Zou Zhiping Yu |
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Affiliation: | (1) Institute of Microelectronics, Tsinghua University, Beijing, 100084, China |
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Abstract: | A physical model for hole mobility under either biaxial or uniaxial stress has been developed. The six-band k ? p theory is used to obtain the bandstructure through stress-dependent Hamiltonian. The hole mobility in the silicon inversion layer is studied in details using Monte Carlo method. A numerically robust method has been applied to achieve self-consistent solution of Poisson’s and Schrödinger equations. |
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Keywords: | k p Hole mobility Uniaxial stress |
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