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磁控溅射工艺对沉积丙纶无纺布基底金属薄膜的影响
引用本文:黄美林, 任永聪, 梁竞鹏, 王晓如, 林雪莹, 鲁圣国. 磁控溅射工艺对沉积丙纶无纺布基底金属薄膜的影响[J]. 真空科学与技术学报, 2019, 39(11): 937-943. DOI: 10.13922/j.cnki.cjovst.2019.11.01
作者姓名:黄美林  任永聪  梁竞鹏  王晓如  林雪莹  鲁圣国
作者单位:1.1. 五邑大学 纺织材料与工程学院 广东省功能性纤维与纺织品工程技术研究中心 江门 529020
基金项目:五邑大学创新创业项目(FZ170502A1)
摘    要:本文利用直流磁控溅射法在丙纶无纺布基底沉积铜、不锈钢及氧化铜薄膜,研究了本底真空度、工作气体流量、溅射功率、工作气压等溅射工艺参数对薄膜沉积速率、薄膜厚度和表面形貌的影响规律,测试了镀膜前后样品的抗紫外和抗红外性能。结果表明,一定范围内的本底真空度的变化对成膜性能影响很小;存在一个比较合适的氩气流量大小和工作气体压强范围,使得沉积速率最大;沉积速率与溅射功率成正相关关系。经测试,镀铜膜后的织物抗紫外性能明显提高。

关 键 词:磁控溅射  薄膜  金属膜  织物镀膜  抗紫外
收稿时间:2019-03-31

Synthesis and Characterization of Magnetron Sputtered Conductive Coating on Non-Woven Fabric Substrates
Huang Meilin, Ren Yongcong, Liang Jingpeng, Wang Xiaoru, Lin Xueying, Lu Shengguo. Synthesis and Characterization of Magnetron Sputtered Conductive Coating on Non-Woven Fabric Substrates[J]. CHINESE JOURNAL VACUUM SCIENCE AND TECHNOLOGY, 2019, 39(11): 937-943. DOI: 10.13922/j.cnki.cjovst.2019.11.01
Authors:Huang Meilin  Ren Yongcong  Liang Jingpeng  Wang Xiaoru  Lin Xueying  Lu Shengguo
Affiliation:1.1. Wuyi University, School of Textile Material and Engineering, Engineering Technology Research Center for Functional Fiber and Fabric of Guangdong Province, Jiangmen 529020, China
Abstract:Conductive coatings,of stainless steel,Cu and CuO,were deposited on substrate of polypropylene(PP) non-woven fabric.The influence of the deposition conditions,including the base pressure,argon flow-rate,sputtering power,deposition rate and film thickness,on the anti-ultraviolet(infrared) behavior was investigated with X-ray diffraction,scanning electron microscopy,atomic force microscopy and Fourier transform infrared(FTIR) spectroscopy.The preliminary results show that the Cu-coating considerably increased the anti-ultraviolet function of the fabric.As expected,a higher sputtering power increased the deposition rate,improved the compactness,decreased the grain-size and strengthened the interfacial adhesion.A high pressure of residual gases negatively affected the film growth.The argon flow rate,pressure,deposition rate,and film thickness should be optimized depending on the anti-ultraviolet(infrared) requirements,applications and production cost.
Keywords:Magnetron sputtering  Thin-film  Metal film  Fabric coating  Anti-ultraviolet
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