| 磁控溅射对薄膜附着力的影响 |
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| 引用本文： | 余凤斌,陈莹.磁控溅射对薄膜附着力的影响[J].绝缘材料,2008,41(6). |
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| 作者姓名： | 余凤斌 陈莹 |
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| 作者单位： | 山东天诺光电材料有限公司,济南,250101;山东现代职业学院,济南,250108 |
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| 摘 要： | 磁控溅射技术因具有溅射速率高、无污染、可制备各种不同功能的薄膜等优点而得到广泛地应用。综述了薄膜附着力机理,分析了影响薄膜性能的因素,结果表明,薄膜的附着力是影响薄膜性能的主要因素。影响薄膜附着力的因素有:基材的表面清洁度、制备薄膜的各种工艺参数、热处理、原料的纯度等。
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| 关 键 词： | 磁控溅射 附着力 综述 |
The Influence Factor of Thin Films Adhesion Prepared by Magnetron Sputtering |
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| YU Feng-bin,CHEN Ying.The Influence Factor of Thin Films Adhesion Prepared by Magnetron Sputtering[J].Insulating Materials,2008,41(6). |
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| Authors: | YU Feng-bin CHEN Ying |
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| Abstract: | Magnetron sputtering technology has a lot of advantages,such as high rate of sputtering and non-polluting,it can be used in preparing kinds of films with a variety of performance.Film adhesion is one of the important factors that influences film properties.In this paper,the mechanism of film adhesion and its influence factor were summarized,which can provide a reference for improving adhesion of films. |
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| Keywords: | magnetron sputtering adhesion review |
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