| 磁控溅射对薄膜附着力的影响 |
| |
| 引用本文： | 余凤斌,陈莹. 磁控溅射对薄膜附着力的影响[J]. 绝缘材料, 2008, 41(6) |
| |
| 作者姓名： | 余凤斌 陈莹 |
| |
| 作者单位： | 山东天诺光电材料有限公司,济南,250101;山东现代职业学院,济南,250108 |
| |
| 摘 要： | 磁控溅射技术因具有溅射速率高、无污染、可制备各种不同功能的薄膜等优点而得到广泛地应用。综述了薄膜附着力机理,分析了影响薄膜性能的因素,结果表明,薄膜的附着力是影响薄膜性能的主要因素。影响薄膜附着力的因素有:基材的表面清洁度、制备薄膜的各种工艺参数、热处理、原料的纯度等。
|
| 关 键 词： | 磁控溅射 附着力 综述 |
The Influence Factor of Thin Films Adhesion Prepared by Magnetron Sputtering |
| |
| YU Feng-bin,CHEN Ying. The Influence Factor of Thin Films Adhesion Prepared by Magnetron Sputtering[J]. Insulating Materials, 2008, 41(6) |
| |
| Authors: | YU Feng-bin CHEN Ying |
| |
| Abstract: | Magnetron sputtering technology has a lot of advantages,such as high rate of sputtering and non-polluting,it can be used in preparing kinds of films with a variety of performance.Film adhesion is one of the important factors that influences film properties.In this paper,the mechanism of film adhesion and its influence factor were summarized,which can provide a reference for improving adhesion of films. |
| |
| Keywords: | magnetron sputtering adhesion review |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
