| Abstract: | The thermal stability of amorphous Fe_78Co_4.3Si_5.9B_11.8 thin film prepared by sputtering has been studied using thermomagnatie measurements, differential thermal analysis, electron microscopic analysis, electron diffraction and X-ray diffraction. It is observed that the crys-tallization process of sputtering film is different from that of melt quenching ribbons. The crystallization temperature of the former is much lower than that of latter. The preparing condition have an important effect on the thermal stability. |
