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Dependence of surface morphology of CVD diamond films on deposition conditions
作者姓名:YANGGuowei  MAOYude
作者单位:[1]Dept.ofPhys.XiangtanUniversity,Xiangtan411105,CHN [2]Dept.ofAppl.Phys.HefeiUniversityofTechnol,Hefei2300
摘    要:The diamond films have been deposited by the hot filament CVD method on molybdenum substrates from the mixture reactant gas of acetone and hy-drogen.The surface morphologies of the obtained diamond films under various de-position conditions have been observed by scanning electron microscope (SEM).The experimental results strongly indicate that the surface morphologies of the re-sulting films have closely related to the deposition conditions,i.e.,reaction pres-sure.For molybdenum substrates,under the lower reaction pressure the surface morphologies of the grains comprising the resulting films mainly display the small single crystal cubo-octahedron and double small crystal cubo-octahedron;under the higher reaction pressure ,the surface morphologies mainly display the large cauliflower-like .These results show that there are various crystal habits for CVD diamond under various deposition conditions .

关 键 词:化学气相沉积  介电薄膜  光薄膜  沉积条件  材料实验
收稿时间:1994/9/8

Dependence of surface morphology of CVD diamond films on deposition conditions
YANGGuowei MAOYude.Dependence of surface morphology of CVD diamond films on deposition conditions[J].Semiconductor Photonics and Technology,1995,1(1):88-92.
Abstract:The diamond films have been deposited by the hot filament CVD method on molybdenum substrates from the mixture reactant gas of acetone and hydrogen.The surface morphologies of the obtained diamond films under various deposition conditions have been observed by scanning electron microscope(SEM).The experimental results strongly indicate that the surface morphologies of the resulting films have closely related to the deposition conditions,i.e.,reaction pressure.For molybdenum substrates,under the lower reacti...
Keywords:Dielectric Thin Films  Optical Films  CVD  Material Testing
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