| 脉冲激光沉积ZrW2O8薄膜的制备和性能 |
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| 引用本文： | 刘红飞,张志萍,张伟,陈小兵,程晓农.脉冲激光沉积ZrW2O8薄膜的制备和性能[J].无机材料学报,2011(5):540-544. |
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| 作者姓名： | 刘红飞 张志萍 张伟 陈小兵 程晓农 |
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| 作者单位： | 扬州大学物理学院;江海学院;江苏大学材料科学与工程学院; |
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| 基金项目： | 国家自然科学基金(50372027); 江苏省高校自然科学重大基础研究项目(06KJA43010); 扬州大学人才引进项目(0274640015427)~~ |
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| 摘 要： | 采用脉冲激光沉积法在石英基片上沉积制备了ZrW2O8薄膜.用X射线衍射仪(XRD)、原子力显微镜(AFM)研究了不同衬底温度对薄膜结构组分、表面粗糙度和形貌的影响,用台阶仪和分光光度计测量薄膜的厚度和不同衬底温度下制备薄膜的透射曲线,用变温XRD分析了ZrW2O8薄膜的负热膨胀特性.实验结果表明:在衬底温度为室温、550℃和650℃下脉冲激光沉积的ZrW2O8薄膜均为非晶态,非晶膜在1200℃保温3min后淬火得到立方相ZrW2O8薄膜;随着衬底温度的升高,ZrW2O8薄膜的表面粗糙度明显降低;透光率均约为80%,在20～600℃温度区间内,脉冲激光沉积制备的ZrW2O8薄膜的负热膨胀系数为-11.378×10-6 K-1.
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| 关 键 词： | 钨酸锆 薄膜 脉冲激光沉积 负热膨胀 透射率 |
Preparation and Properties of ZrW_2O_8 Thin Films Deposited by Pulsed Laser Deposition |
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| LIU Hong-Fei,ZHANG Zhi-Ping,ZHANG Wei,CHEN Xiao-Bing,CHENG Xiao-Nong.Preparation and Properties of ZrW_2O_8 Thin Films Deposited by Pulsed Laser Deposition[J].Journal of Inorganic Materials,2011(5):540-544. |
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| Authors: | LIU Hong-Fei ZHANG Zhi-Ping ZHANG Wei CHEN Xiao-Bing CHENG Xiao-Nong |
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| Affiliation: | LIU Hong-Fei1,ZHANG Zhi-Ping2,ZHANG Wei1,CHEN Xiao-Bing1,CHENG Xiao-Nong3(1.College of Physics Science and Technology,Yangzhou University,Yangzhou 225002,China,2.Jianghai College,Yangzhou 225101,3.School of Materials Science and Engineering,Jiangsu University,Zhenjiang 212013,China) |
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| Abstract: | ZrW2O8 thin films were deposited on quartz substrates by pulsed laser deposition method.Effects of sub-strate temperature on the microstructure,composition,surface roughness and morphology of the ZrW2O8 thin films were observed by X-ray diffraction(XRD) and atomic force microscope(AFM).The thickness and optical transmittance of the ZrW2O8 thin films were measured by surface profilometer and spectrophotometer respectively.The negative thermal expansion property of the ZrW2O8 thin film was measured by high te... |
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| Keywords: | ZrW2O8 thin film pulsed laser deposition negative thermal expansion transmittance |
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