Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques |
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| Authors: | Taíse Matte Manhabosco and Iduvirges L. Müller |
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| Affiliation: | (1) Laboratory of Corrosion Research, Metallurgy Department, Universidade Federal do Rio Grande do Sul, Av. Bento Gon?alves 9500/Setor 4/Prédio 75/232, Porto Alegre, 91501-970, Rio Grande do Sul, Brazil |
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| Abstract: | In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film. |
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