Reactive Low Voltage Ion Plating (RLVIP). Prozess‐, Plasma‐ und Schichteigenschaften am Beispiel von Ta2O5/SiO2

Reactive Low Voltage Ion Plating (RLVIP) is a process for production of chemical compound films mainly by direct synthesis from the elements. It can be used for deposition of single layer and multilayer oxide coatings onto unheated glass and other unheated substrates. An introduction to the RLVIP process will be given, together with some relevant plasma process data and optical and mechanical film properties of Ta₂O₅ films and Ta₂O₅/SiO₂ multilayers. The process plasma was analysed by plasma monitoring (PPM421), a Langmuir probe system (Smartprobe) and a Faraday Cup System (MIEDA). A correlation between plasma data and optical/mechanical properties will be shown.