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Fabrication of wrinkled carbon nano-films with excellent field emission characteristics
Authors:Jia yu Wang   Tokuyuki Teraji  Toshimichi Ito
Affiliation:aDepartment of Electrical Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
Abstract:B-doped nano-structured carbon films were deposited on Si substrates by means of chemical-vapour-deposition with 3.8-kW microwave-plasma. Scanning electron microscope images show that the deposited films were composed of wrinkled graphitic nano-sheets with considerable disorder structures. Field emission (FE) characteristics measured from such films yielded considerably high FE currents, being larger than 50 mA/cm2 at a macroscopic electric field of 9.5 V/μm. A possible mechanism of the observed FEs is discussed in relation to a modified Fowler–Nordheim equation considering field-dependent parameters. As a result, it is found that the structure of the surface geometry mainly increased the FE current densities. Adding a suitable amount of B-component gas to the carbon source gas resulted in a considerable increase in the FE areas of the wrinkled carbon nano-films.
Keywords:Field emission   B-doping   Nano-carbon   CVD
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