In situ impedance study of the Y-Ni thin film under electrochemical hydrogenation |
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Authors: | Eugenia Matveeva Vitali Parkhutik |
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Affiliation: | Center of Materials and Technology of Microfabrication, Department of Materials Science, Technical University of Valencia, Cami de Vera s/n, 46022 Valencia, Spain |
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Abstract: | A thin film of yttrium Y (150 nm) protected by a 6 nm coating of nickel Ni on a glass substrate was completely hydrogenated in a 1 M NaOH electrolyte at a constant negative current until the transparent Y tri-hydride phase was achieved and hydrogen gas evolution from the electrode began. A series of impedance measurements were performed in situ during the electrochemical experiment to study the properties of the system as dependent on hydrogenation degree and time of relaxation. The equivalent electrical circuit (EEC) simulations were performed with a Randles-like scheme R0[R1CPE1], where R0 is the thin film electrode resistance, R1 the charge transfer resistance and CPE1 is the capacitive constant phase element. The behavior of all the components of the EEC undergoes a clear transition when the hydrogenation degree of the electrode is approximated to its maximum value (H to Y ratio 2.7) and electrochemical process changes from hydrogen uptake to hydrogen evolution. |
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Keywords: | Y thin film Ni protection Hydrogenation Impedance Equivalent electrical circuit analysis |
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