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相位掩模法制作光纤光栅的研究
引用本文:刘永红,王黎.相位掩模法制作光纤光栅的研究[J].光通信研究,1997(2):46-50.
作者姓名:刘永红  王黎
作者单位:华中理工大学,河南省机械设备进出口公司
摘    要:准分子激光照射相位掩模后,在近场形成周期的条纹分布,利用近场光强对光敏光纤进行曝光,可以在纤芯中写入光栅,从衍射的频谱理论出发,导出具有一定发散的准单色准分子激光照射掩模时产生的近场光强分布,分析了光源发散角及掩模衍射特性对纤芯 强分布及光纤光栅制作的影响,并把分析结果与实验现象进行了比较。

关 键 词:相位掩模  光纤光栅  近场光强分布

Theory Analysis of Grating Production with Phase Masks
Liu Yonghong\ \ Huang Dexiu.Theory Analysis of Grating Production with Phase Masks[J].Study on Optical Communications,1997(2):46-50.
Authors:Liu Yonghong\ \ Huang Dexiu
Affiliation:Liu Yonghong\ \ Huang Dexiu (Huazhong University of Science and Technology Wuhan\ \ 430074) Wang Li\ \ Guo Jianming (Henan Machinery & Equipment Import & Export Corporation\ \ 450003)
Abstract:When excimer Laser irradiate phase masks,the periodic fringe patterns are formed in near field,exposing fibers to it,in core gratings can be induced.In this paper,according to spectrum theories of diffraction,we access the near field intense distributions produced by a periodic mask exposed using an quasimonochromatic excimer laser with a certain divergence,the influence of beam divergence and phase mask characterization on the intense distribution and production of fiber grating is analysized.Results is compared with experiment.
Keywords:phase mask  \ fiber grating  \ near  field intense distribution  
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