Partial oxidation of CH4 at low pressure over SiO2 prepared from Si |
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| Authors: | Takehiko Ono Hiroyuki Kudo Jyun Maruyama |
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| Affiliation: | (1) Department of Applied Chemistry, University of Osaka Prefecture, 1-1 Gakuencho, Sakai, 593 Osaka, Japan |
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| Abstract: | The oxidation of CH4 with O2 at low pressure was carried out over SiO2 prepared from metal Si. The Si showed only total oxidation activity while the Si partly oxidized to SiO2 showed high selectivities to CH3OH and HCHO. The results on SiO2 prepared from Si were compared with those over commercial silicas. The role of SiO2 in the CH4 oxidation was discussed. |
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| Keywords: | partial oxidation of CH4 CH3OH HCHO SiO2 catalyst |
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