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| 曝光量对介质阻挡放电照相的影响 | |
| 引用本文： | 翁明,陈启升,吴日赐.曝光量对介质阻挡放电照相的影响[J].高压电器,2001,37(1):14-16. |
| 作者姓名： | 翁明 陈启升 吴日赐 |
| 作者单位： | 1. 西安交通大学, 2. 广东福地科技股份有限公司, 3. 上海永新彩色显象管有限公司, |
| 基金项目： | 国家自然科学基金资助项目50077015 |
| 摘 要： | 本文叙述了介质阻挡放电照相技术的基本原理 ,给出了自制的实验装置 ,并研究了不同曝光时间、不同放电回路电阻对照相质量的影响。在此基础上 ,提出在采用高压纳秒脉冲放电技术的前提下 ,综合控制曝光时间和放电回路电阻 ,是获得良好质量介质阻挡放电像的又一关键 |
| 关 键 词： | 介质阻挡放电照相 纳秒脉冲 汞润触点继电器 |
| 文章编号： | 1001－1609(2001)01－0014－03 |
| 修稿时间： | 2000年9月6日 |
EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY |
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| Weng Ming,CHEN Qisheng,WU Rici.EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY[J].High Voltage Apparatus,2001,37(1):14-16. | |
| Authors: | Weng Ming CHEN Qisheng WU Rici |
| Abstract: | In this paper, the basic principle of dielectric barrier discharge photography(DBDP) is discussed. An imaging equipment is set up for the purpose of studying the effect of exposure on the DBDP, by which this influences of exposure time and resistance in discharge circuit on the quality of DBDP are studied, respectively. Based on this results, the author advances that in the premise of using high voltage nanosecond pulse discharge technology, controlling the exposure time and the resistance synthetically is a key for getting a good image of DBDP. |
| Keywords: | dielectric barrier discharge photography nanosecond pulse mercury wetted contact relay |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |