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真空电弧沉积多元膜复合靶成分离析效应的研究
引用本文:曾鹏,胡社军,谢光荣. 真空电弧沉积多元膜复合靶成分离析效应的研究[J]. 真空科学与技术学报, 2000, 20(5): 373-376
作者姓名:曾鹏  胡社军  谢光荣
作者单位:广东工业大学机械工程系!广州510643
基金项目:广东省高教厅基金项目!(970 0 32 )
摘    要:用Ti/Mo ,Ti/W和Ti/Me(Me为Fe Cr Al合金 )复合靶采用真空电弧技术沉积了多元膜 ,并对成分离析效应及组织和性能进行了研究。结果表明 ,工作弧电流和阴极镶嵌体的弧斑平均电流对成分离析效应影响程度较大 ,Ti/Me复合靶存在一个无成分离析效应的平衡点。多元膜结构主要为组元原子固溶于Ti2 N中的结构形式 ,并具有较高的显微硬度

关 键 词:真空电弧沉积  成分离析  多元膜  微结构
修稿时间:2000-01-05

Studies of Demixing of Composite Target in Vacuum Arc Deposition for Multielement Films Growth
Zeng Peng,Hu Shejun,Xie Guangrong,Huang Nacan,Wu Qibai. Studies of Demixing of Composite Target in Vacuum Arc Deposition for Multielement Films Growth[J]. JOurnal of Vacuum Science and Technology, 2000, 20(5): 373-376
Authors:Zeng Peng  Hu Shejun  Xie Guangrong  Huang Nacan  Wu Qibai
Abstract:Multielement films were deposited by vacuum arc ion plating using the Ti/Mo,Ti/W and Ti/Me(Me:Fe Cr Al alloy) compo site cathode targets.The composition demixing,microstructure and properties of the films were studied.The results showed that the working arc current and average current of arc spot of the mosaic cathode materials strongly affect composition demixing.Composite target of Ti/Me has a balance point with no demixing.The structure of the films was mainly Ti 2N in which multielement atoms were dissolved.The films has high microhardness.
Keywords:Vacuum arc deposition  Composition demixing  Multielement film  Microstructure
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